• Specially suitable for high-quality coating of non-conductive samples in scanning electron microscopy imaging, and also used for scanning electron microscopy energy spectrum analysis.
  

  Main characteristics

  lpass through1Connected to a vacuum pump, it can ensure good gold and carbon plating effects without any cross contamination between carbon and metal.

  lBy using an efficient low-voltage DC magnetron head for cold state fine spraying process, the surface of the sample is avoided from being damaged.

  lThe digital spray coating current control is not affected by the argon gas pressure in the sample chamber, and can achieve consistent coating rate and optimal coating effect.

  Multiple metal target materials can be used:Pt，Au/Pd，Au，Pt/Pd（PtTarget as standard), target material replacement is fast and convenient.

  lthrough the use ofMTM-20The high-resolution film thickness controller (optional) stops the spraying process when the set film thickness is reached.

  lThe unique feedback controlled carbon rod evaporation system can achieve high film thickness20nmPerform multiple evaporation on both sides without the need for cutting or adjusting the shape of the carbon rod.

  lThe high-purity carbon rod used can achieve high-quality coating effect under high magnification conditions.

  lUsing a new type of evaporation device: current and voltage are monitored through the sensing line of the magnetic head, and the evaporation source is controlled as part of the feedback loop. This evaporation device endows conventional carbon rods with excellent stability and reproducibility. Low power consumption and excellent re evaporation characteristics of carbon rods. The evaporation source can be operated in a pulsed or continuous manner.

  lIn automatic mode, the evaporation source sprays according to the programmed voltage and time. In manual mode, the unique design allows for operation in pulse or continuous mode, and the output voltage is controlled through a knob.

  Technical Parameter

  Gold plating system
  Sample Room Size	diameter120mmx 120mmtall
  Target material	AuTarget as standard,Au:Pd, Pt, Pt:Pd(Optional);Size: Diameter57mmx 0.1mmthick
  sample stage	Can be loaded12individualSEMThe sample holder has a height adjustable range of60mm Optional rotating tilted sample stage, rotation speed:0~120rpmAdjustable, tilt angle:0~90° Adjustable. The rotating sample stage has a separate chamber protection to prevent contamination.
  Sputtering control	Microprocessor control, safety interlock, adjustable, maximum current40mAProgrammatic digital control
  Sputtering head	Low voltage planar magnetron, fast target material replacement, surrounding dark area shield
  Analog metrology	Vacuum:Atm - 0.001mbar electric current:0—50mA
  Thickness monitoring (option)	useMTM-20High resolution thickness controller (optional) automatically terminates the sputtering process, or usesMTM-10High resolution thickness monitoring instrument (optional) manually terminates the sputtering process
  Control method	Automatic gas exchange and release function, automatic sorting processing, digital timer with "pause" control（0－300s）Automatic deflation
  Desktop system	The vacuum pump can be placed on a seismic platform, with a fully metal integrated coupling system
  Carbon plating system
  Sample Room Size		diameter120 x 120mmtall
  Steam source		Bradleytype(6.15mm rods, [1/4"]) High strength stainless steel structure
  Evaporation control		Feedback loop control based on microprocessor, capable of remote current control/Voltage induction, safety interlock function based on vacuum level variable, maximum current180AProvide overcurrent protection
  sample stage		Can be installed12A sample holder, with a height of30mmAdjustable within the range
  Analog metrology		vacuum: atmos - 0.001mb;electric current: 0-200A
  Control method		Automatic evaporation control, using programmed voltage and time Fully manual control in pulse or continuous mode Digital timer（0－9.9s） Digital voltage setting（0.1 to 6.0V）
  vacuum system
  vacuum pump		2Direct connected high-speed vacuum pump
  pumping speed		100L/MIN
  noise		50dB
  mbar		≤1 x 10-3 Torr